Apparatus and method for controlling polishing of integrated cir

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451285, 451288, B24B 4900, B24B 5100

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active

061027766

ABSTRACT:
A system for polishing a surface. The surface is positioned in contact with a rotating table having a polishing slurry or compound applied to a table surface. The pattern formed in the polishing compound as the table is rotated is monitored, and when the pattern dimensions reach a predetermined size, indicating a polished end point, the polisher ends polishing.

REFERENCES:
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 5081421 (1992-01-01), Miller et al.
patent: 5234868 (1993-08-01), Cote
patent: 5433650 (1995-07-01), Winebarger
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5492594 (1996-02-01), Burke et al.
patent: 5637185 (1997-06-01), Murarka et al.
patent: 5660672 (1997-08-01), Li et al.
patent: 5667424 (1997-09-01), Pan

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