Apparatus and method for cleaning a glass substrate before...

Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents

Reexamination Certificate

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C134S002000, C134S026000, C134S027000

Reexamination Certificate

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07402212

ABSTRACT:
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

REFERENCES:
patent: 5881750 (1999-03-01), Yoshitani
patent: 5980643 (1999-11-01), Jolley
patent: 6526995 (2003-03-01), Hackenberg
patent: 6531436 (2003-03-01), Sahbari et al.

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