Apparatus and method for cleaning a glass substrate before...

Details Apparatus and method for cleaning a glass substrate before... Apparatus and method for cleaning a glass substrate before...

2008-07-22

2008-07-22

Warden, Jill (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S002000, C134S026000, C134S027000

Reexamination Certificate

active

07402212

ABSTRACT:
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

REFERENCES:
patent: 5881750 (1999-03-01), Yoshitani
patent: 5980643 (1999-11-01), Jolley
patent: 6526995 (2003-03-01), Hackenberg
patent: 6531436 (2003-03-01), Sahbari et al.

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