Apparatus and method for applying RF power apparatus and method

Details Apparatus and method for applying RF power apparatus and method Apparatus and method for applying RF power apparatus and method

1997-12-24

2000-02-29

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723I, 118723IR, 438758, 438689, 333 33, H05H 124, H03H 738, C23C 1600

Patent

active

06030667&

ABSTRACT:
On the bottom of a chamber, there is provided a lower electrode for supporting an object to be processed with intervention of an insulator. A first RF power source applies RF power to a multiple spiral coil composed of four spiral coil elements connected in parallel via an impedance matcher. The length of each of the coil elements corresponds to 1/4 of the wavelength of the RF power supplied from the first RF power source. A second RF power source applies an RF bias voltage to the lower electrode.

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