Apparatus and method for adiabatically heating a...

Details Apparatus and method for adiabatically heating a... Apparatus and method for adiabatically heating a...

2005-10-04

2005-10-04

Niebling, John F. (Department: 2812)

Optics: measuring and testing

By light interference

Using fiber or waveguide interferometer

C438S682000

Reexamination Certificate

active

06952269

ABSTRACT:
A method for adiabatically heating semiconductor device surfaces, including using capping layers to prevent deformation of surfaces. Using the method, semiconductor surfaces having varying topographies or topologies may be heated adiabatically. In an embodiment of the method, one or more capping layers may be formed over a semiconductor surface, to further prevent deformation of semiconductor surfaces.

REFERENCES:
patent: 4615765 (1986-10-01), Levinson
patent: 6420264 (2002-07-01), Talwar
American Institute of Physics Handbook, Dwight E. Gray, ISBN 07-001485-X, Mcgraw-Hill 1972.p. 6-118-6-123.

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