Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1998-12-18
1999-11-09
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, 20429816, 20429817, C23C 1432
Patent
active
059807075
ABSTRACT:
A magnet assembly may comprise a first magnet plate having a first magnet mounted thereon and a second magnet plate having a second magnet mounted thereon and a third magnet mounted thereon adjacent the second magnet so that a pole axis of the second magnet is substantially perpendicular to a pole axis of the third magnet. The second magnet plate is positioned adjacent the first magnet plate so that a plasma-confining magnetic field is created between the first, second, and third magnets. The first and second magnet plates are also moveable with respect to one another so that they can be moved between a center position configuration and an end position configuration. An actuator operatively associated with the first and second magnet plates moves the first and second magnet plates with respect to one another so that the first and second magnet plates are located at about the center position configuration for a time that is greater than a time that the first and second magnet plates are located at about the end position configuration.
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Cantelmo Gregg
Dahl, Esq. Bruce E.
Nguyen Nam
Sierra Applied Sciences, Inc.
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