Coating apparatus – Gas or vapor deposition
Patent
1998-01-09
2000-08-29
Silverman, Stanley S.
Coating apparatus
Gas or vapor deposition
118725, 118728, 118729, 118730, 438717, 438942, 2504922, 2505151, C23C 1600
Patent
active
061102849
ABSTRACT:
A semiconductor processing system comprising a semiconductor processing chamber, a light, a temperature detector, and a member. The light is positioned to heat the confines of the chamber. The temperature detector measures the temperature at the location within the chamber. The member has a translucent quartz shell and opaque core and shields the location from light emanating from the light source.
REFERENCES:
patent: 2223118 (1940-11-01), Miller
patent: 2858451 (1958-10-01), Silversher
patent: 3882901 (1975-05-01), Seiler et al.
patent: 3925583 (1975-12-01), Rau et al.
patent: 4041872 (1977-08-01), McCown et al.
patent: 4550245 (1985-10-01), Arai et al.
patent: 5562774 (1996-10-01), Breidenbach et al.
patent: 5583318 (1996-12-01), Powell
patent: 5589003 (1996-12-01), Zhao et al.
patent: 5660472 (1997-08-01), Peuse et al.
patent: 5781693 (1998-07-01), Ballance et al.
Chen Chen-An
Chen Steven A.
Ho Henry
Applied Materials Inc.
Colaianni Michael P.
Silverman Stanley S.
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