Apparatus and a method for measuring a density of defects existi

Details Apparatus and a method for measuring a density of defects existi Apparatus and a method for measuring a density of defects existi

1998-09-03

1999-11-30

Kim, Robert H.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356337, 356343, G01N 2100

Patent

active

059952172

ABSTRACT:
A laser is irradiated on the surface of a semiconductor wafer while a stage mounted on the semiconductor wafer is moved, and scattering lights emitted from the surface of the semiconductor wafer is received by the receiving device, and an intensity distribution of the scattering lights is measured. The intensity distribution is processed by the controller so as to obtain a defect density of the semiconductor wafer.

REFERENCES:
patent: 5355212 (1994-10-01), Wells
patent: 5877860 (1999-03-01), Klein

Affiliated with

Also associated with

Rating

Apparatus and a method for measuring a density of defects existi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and a method for measuring a density of defects existi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and a method for measuring a density of defects existi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1679922