Apodization measurement for lithographic apparatus

Details Apodization measurement for lithographic apparatus Apodization measurement for lithographic apparatus

2008-01-01

2008-01-01

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07315353

ABSTRACT:
A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

REFERENCES:
patent: 2002/0001088 (2002-01-01), Wegmann et al.
patent: 2002/0027648 (2002-03-01), Van Der Laan et al.
patent: 2006/0007861 (2006-01-01), Kurzmann et al.
patent: WO 2004/057423 (2004-07-01), None

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