Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1979-11-05
1981-05-26
Massie, Jerome W.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156647, 156656, 156657, 1566611, 156662, 156664, 640219, B23P 1516
Patent
active
042696534
ABSTRACT:
A method of manufacturing an aperture stop with a rectangular aperture for an electron beam exposure device, comprising the steps of: preparing a single-crystal silicon substrate with one side having a (100) face; providing a mask on said side of the substrate; selectively etching the substrate through the mask from said side to form a projecting portion of rectangular cross section by anisotropic etching; forming an aperture layer by covering said one side of the etched substrate with a high-melting-point metal having good electric conductivity, thereby surrounding said projecting portion; and forming in said aperture layer a rectangular aperture with a cross section corresponding to the cross section of said projecting portion by removing said substrate from the aperture layer.
REFERENCES:
patent: 3052581 (1962-09-01), Gutknecht
patent: 3303254 (1967-02-01), Simons
patent: 3679500 (1972-07-01), Kubo et al.
patent: 3801390 (1974-04-01), Lepselt er et al.
patent: 3923566 (1975-12-01), Law
patent: 3936329 (1976-02-01), Kendall et al.
patent: 3984620 (1976-10-01), Robillard
patent: 3988153 (1976-10-01), Politycki
patent: 4058432 (1977-11-01), Wolden et al.
patent: 4106975 (1978-08-01), Berkenblit et al.
patent: 4106976 (1978-08-01), Chiou et al.
patent: 4172005 (1979-10-01), Muroaka et al.
Bassous et al., "The Fabrication . . . Silicon", Journal of Electrochemical Society, No. 8, vol. 125, pp. 1321-1327, (1978).
Shinozaki Toshiaki
Wada Hirotsugu
Massie Jerome W.
Vlsi Technology Research Association
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