Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-07-10
2007-07-10
Ghyka, Alexander (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S401000, C438S551000, C438S800000, C257SE21024, C257SE21033, C257SE21038
Reexamination Certificate
active
11118811
ABSTRACT:
Aperture masks and deposition techniques for using aperture masks are described. In addition, techniques for creating aperture masks and other techniques for using the aperture masks are described. The various techniques can be particularly useful in creating circuit elements for electronic displays and low-cost integrated circuits such as radio frequency identification (RFID) circuits. In addition, the techniques can be advantageous in the fabrication of integrated circuits incorporating organic semiconductors, which typically are not compatible with wet processes.
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Baude Paul F.
Fleming Patrick R.
Haase Michael A.
Kelley Tommie W.
Muyres Dawn V.
3M Innovative Properties Company
Fulton Lisa P.
Ghyka Alexander
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