Aparatus for varying the flux of a molecular beam

Details Aparatus for varying the flux of a molecular beam Aparatus for varying the flux of a molecular beam

1994-12-22

1997-04-01

Garrett, Felisa C.

Coating apparatus

Gas or vapor deposition

117200, 117900, 117204, 250251, C30B 3500

Patent

active

056161808

ABSTRACT:
Apparati and methods for varying the flux of a molecular beam emanating from an effusion cell are disclosed. The apparatus includes a means for controllably adjusting the angular distribution of a molecular field effusing from a source material within the effusion cell, therein adjusting the flux of the beam. The method herein disclosed, with respect to the related apparati, including the step of selectively altering the angular distribution of an effusing molecular field, produced by a heated source material, which comprises the molecular beam, thereby varying the flux of the beam.

REFERENCES:
patent: 3839084 (1974-10-01), Cho et al.
patent: 4181544 (1980-01-01), Cho
patent: 4239955 (1980-12-01), Cho
patent: 4518846 (1985-05-01), Freeouf et al.
patent: 4622083 (1986-11-01), Shih
patent: 4640720 (1987-02-01), Foxon
patent: 5041719 (1991-08-01), Harris et al.
patent: 5080870 (1992-01-01), Streetman et al.
patent: 5122393 (1992-06-01), Tuppen et al.
patent: 5336324 (1994-08-01), Stall et al.
patent: 5415128 (1995-05-01), Kao et al.
Anderson et al., Materials Science 4th Ed., Chapman and Hall, New York, 1990, pp. 464-466.

Affiliated with

Also associated with

Rating

Aparatus for varying the flux of a molecular beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aparatus for varying the flux of a molecular beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aparatus for varying the flux of a molecular beam will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-535820