Antistatic photosensitive multilayered structure and method for

Details Antistatic photosensitive multilayered structure and method for Antistatic photosensitive multilayered structure and method for

1995-04-06

1998-07-14

Cain, Edward J.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302733, 430961, G03C 1492

Patent

active

057802025

ABSTRACT:
An antistatic photosensitive multilayered structure of the present invention has at least a photosensitive layer and an antistatic cover film on a substrate in this order.

REFERENCES:
patent: 4786558 (1988-11-01), Sumiya et al.
patent: 4956252 (1990-09-01), Fryd et al.

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