Antireflective hardmask composition and methods for using same

Details Antireflective hardmask composition and methods for using same Antireflective hardmask composition and methods for using same

2005-12-12

2009-12-15

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S276100, C430S313000, C430S914000

Reexamination Certificate

active

07632622

ABSTRACT:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer mixture includinga first polymer that includes one or more of the following monomeric unitswherein A is a bivalent radical selected from the group consisting of carbonyl, oxy, alkylene, fluoroalkylene, phenyldioxy, and any combination thereof; R1and R2are each independently a bivalent radical selected from the group consisting of an alkylene, an arylene, and any combination thereof; and x, y, and z are 0 or integers; anda second polymer including an aryl group;(b) a crosslinking component; and(c) an acid catalyst.

REFERENCES:
patent: 4525523 (1985-06-01), Nakamura et al.
patent: 5420233 (1995-05-01), Isogai et al.
patent: 5518864 (1996-05-01), Oba et al.
patent: 5851730 (1998-12-01), Thackeray et al.
patent: 5886102 (1999-03-01), Sinta et al.
patent: 5939236 (1999-08-01), Pavelcheck et al.
patent: 6607988 (2003-08-01), Yunogami et al.
patent: 2002/0132095 (2002-09-01), Fujii et al.
patent: 2002/0182536 (2002-12-01), Kamada et al.
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2003/0129547 (2003-07-01), Neisser et al.
patent: 2005/0255410 (2005-11-01), Guerrero et al.
patent: 2006/0019195 (2006-01-01), Hatakeyama et al.
patent: 2006/0251990 (2006-11-01), Uh et al.
patent: 2006/0269867 (2006-11-01), Uh et al.
patent: 2007/0059635 (2007-03-01), Oh et al.
patent: 2007/0072111 (2007-03-01), Oh et al.
patent: 2007/0154658 (2007-07-01), Kang et al.
patent: 1204547 (2006-05-01), None
patent: 1-293339 (1989-11-01), None
patent: 06-136122 (1994-05-01), None
patent: 9-146100 (1997-06-01), None
patent: 11-084391 (1999-03-01), None

Affiliated with

Also associated with

Rating

Antireflective hardmask composition and methods for using same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antireflective hardmask composition and methods for using same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antireflective hardmask composition and methods for using same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4128399