Antireflective hardmask composition and methods for using same

Details Antireflective hardmask composition and methods for using same Antireflective hardmask composition and methods for using same

2008-05-27

2008-05-27

Kelly, Cynthia H. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100

Reexamination Certificate

active

07378217

ABSTRACT:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer component including at least one polymer having a monomeric unit of Formula (I)whereinR1and R2may each independently be hydrogen, hydroxyl, alkyl, aryl, allyl, halo, or any combination thereof;R3and R4may each independently be hydrogen, a crosslinking functionality, a chromophore, or any combination thereof;R5and R6may each independently be hydrogen or an alkoxysilane group;R7may each independently be hydrogen, alkyl, aryl, allyl, or any combination thereof; and n may be a positive integer;(b) a crosslinking component; and(c) an acid catalyst.

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