Antireflective hardmask composition and methods for using same

Details Antireflective hardmask composition and methods for using same Antireflective hardmask composition and methods for using same

2008-07-29

2008-07-29

Kelly, Cynthia H. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100

Reexamination Certificate

active

07405029

ABSTRACT:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer component including at least one polymer having a monomeric unit of Formula (I)wherein R1and R2may each independently be hydrogen, hydroxyl, C1-10alkyl, C6-10aryl, allyl, or halo; R3and R4may be each independently be hydrogen, a crosslinking functionality, or a chromophore; R5and R6may each independently be hydrogen or an alkoxysiloxane having the structure of Formula (II), wherein at least one of R5and R6is an alkoxysilane;wherein R8, R9, and R10may each independently be a hydrogen, alkyl, or aryl; and x is 0 or a positive integer; R7may be hydrogen, C1-10alkyl, C6-10aryl, or allyl; and n is a positive integer;(b) a crosslinking component; and(c) an acid catalyst.

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