Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-04-10
2007-04-10
Zimmer, Marc S. (Department: 1712)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S280100, C427S387000, C528S027000, C528S028000, C528S029000, C528S043000
Reexamination Certificate
active
10858997
ABSTRACT:
It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film material, and a pattern formation method using this antireflective film as a hard mask for substrate processing.The present invention provides an antireflective film material comprising a polymer (A) comprising copolymerized repeating units expressed by the Formula (1) and/or the Formula (2), an organic solvent (B), an acid generator (C) and an optional crosslinking agent (D)
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Asano Takeshi
Iwabuchi Motoaki
Ogihara Tsutomu
Yagihashi Fujio
Myers Bigel & Sibley Sajovec, PA
Shin-Etsu Chemical Co. , Ltd.
Zimmer Marc S.
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