Antireflective film-forming composition, method for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C528S041000, C528S043000, C438S952000, C430S270100

Reexamination Certificate

active

07541134

ABSTRACT:
The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film which is to be processed. The present invention also provides a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film-forming composition, and a pattern formation method that uses this antireflective film as a hard mask, and a pattern formation method that uses this antireflective film as a hard mask for processing the substrate. The present invention also provides an antireflective film-forming composition comprising an organic solvent, a cross linking agent, and a polymer comprising a light absorbing group obtained by hydrolyzing and condensing more than one type of silicon compound, a crosslinking group and a non-crosslinking group.

REFERENCES:
patent: 3741932 (1973-06-01), Smith
patent: 4822716 (1989-04-01), Onishi et al.
patent: 5100503 (1992-03-01), Allman et al.
patent: 5158854 (1992-10-01), Imamura et al.
patent: 5248750 (1993-09-01), Takarada et al.
patent: 5270116 (1993-12-01), Melancon et al.
patent: 5457003 (1995-10-01), Tanaka et al.
patent: 6054254 (2000-04-01), Sato et al.
patent: 6114085 (2000-09-01), Padmanaban et al.
patent: 6251562 (2001-06-01), Breyta et al.
patent: 6268113 (2001-07-01), DeBoer et al.
patent: 6268457 (2001-07-01), Kennedy et al.
patent: 6340734 (2002-01-01), Lin et al.
patent: 6382620 (2002-05-01), Gaarder et al.
patent: 6391999 (2002-05-01), Crivello
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6503692 (2003-01-01), Angelopoulos et al.
patent: 6506497 (2003-01-01), Kennedy et al.
patent: 6506997 (2003-01-01), Matsuyama
patent: 7163778 (2007-01-01), Hatakeyama et al.
patent: 2001/0036998 (2001-11-01), Sakamoto et al.
patent: 2002/0042020 (2002-04-01), Gallagher et al.
patent: 2002/0058205 (2002-05-01), Nakashima et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 2003/0209515 (2003-11-01), Pavelchek
patent: 2004/0191479 (2004-09-01), Hatakeyama et al.
patent: 2005/0277755 (2005-12-01), Hamada et al.
patent: 2005/0277756 (2005-12-01), Iwabuchi et al.
patent: 63138353 (1988-06-01), None
patent: 5-27444 (1993-02-01), None
patent: 6-138664 (1994-05-01), None
patent: 95069611 (1995-07-01), None
patent: 2001053068 (2001-02-01), None
patent: 2001092122 (2001-04-01), None
patent: 2001343752 (2001-12-01), None
patent: WO 00/77575 (2000-12-01), None
English translation of JP, 06-138664, A (1994) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Mar. 26, 2008, 9 pages.
Publication No. JP63138353, esp@cenet document, one page, English abstract of JP63-138353 published Jun. 10, 1988, applicant Tokyo Ohka Kogyo Co Ltd, submitted Jul. 2008.
Tom Lynch, Valerie Paradis, Mark Spak, Wayne MoreauProperties and Performance of Near UV Reflectivity Control Layers, Proceedings of SPIE May 1994, pp. 225-229, vol. 2195.
Qinghuang Lin, et al.,A High Resolution 248 nm Bilayer Resist, Proceedings of SPIE, Mar. 1999, pp. 241-250, vol. 3678.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Antireflective film-forming composition, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antireflective film-forming composition, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antireflective film-forming composition, method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4145772

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.