Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-06-10
2009-06-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C528S041000, C528S043000, C438S952000, C430S270100
Reexamination Certificate
active
07541134
ABSTRACT:
The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film which is to be processed. The present invention also provides a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film-forming composition, and a pattern formation method that uses this antireflective film as a hard mask, and a pattern formation method that uses this antireflective film as a hard mask for processing the substrate. The present invention also provides an antireflective film-forming composition comprising an organic solvent, a cross linking agent, and a polymer comprising a light absorbing group obtained by hydrolyzing and condensing more than one type of silicon compound, a crosslinking group and a non-crosslinking group.
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English translation of JP, 06-138664, A (1994) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Mar. 26, 2008, 9 pages.
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Asano Takeshi
Hamada Yoshitaka
Iwabuchi Motoaki
Ogihara Tsutomu
Pfeiffer Dirk
Alston & Bird LLP
Hamilton Cynthia
International Business Machines - Corporation
Shin-Etsu Chemical Co., Ltd
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