Antireflective film for photoelectric devices and manufacturing

Details Antireflective film for photoelectric devices and manufacturing Antireflective film for photoelectric devices and manufacturing

1986-10-21

1987-06-16

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20419215, 20419226, 20419227, C23C 1400

Patent

active

046734767

ABSTRACT:
An antireflective film (7, 8) for photoelectric devices comprises at least a layer having a refractive index being the largest on the side abutting on the light receiving surface (2a) or the light emitting surface of a photoelectric device and continuously decreasing according to the distance outward from said side.

REFERENCES:
patent: 3960441 (1976-06-01), Kamiya et al.
patent: 4286009 (1981-08-01), Griest
patent: 4331737 (1982-05-01), Nishizawa et al.
patent: 4416952 (1983-11-01), Nishizawa et al.
patent: 4428979 (1984-01-01), Nakamura et al.
patent: 4428980 (1984-01-01), Nakamura et al.
patent: 4486285 (1984-12-01), Aubert
"Antireflection Layers for GaAs Solar Cells", N. D. Arora et al, J. Appl. Phys. 53 (12, Dec. 1982, pp. 8839-8846.
"Plasma-Enhanced CVD Silicon Nitride Antireflection Coatings for Solar Cells", C. C. Johnson et al, Solar Energy, vol. 31, No. 4, 1983, pp. 355-358.
"Physicochemical Properties of Chemical Vapor-Deposited Silicon Oxynitride from a SiH.sub.4 --CO.sub.2 --NH.sub.3 --H.sub.2 System", A. K. Gaind et al, J. Electrochem. Soc., Solid-State Science and Technology, Jan. 1978, pp. 139-145.
"Optical Properties of Reactively Sputtered Ta.sub.2 O.sub.5 Films", F. Rubio et al, J. Vac. Sci. Technol., 21 (4), Nov./Dec. 1982, pp. 1043-1045.
"Anti-Reflection Coatings for Thin-Film Polycrystalline CdS/Cu.sub.2 S Solar Cells", J. A. Bragagnolo et al, J. Vac. Sci. Technol., 18 (2), Mar. 1981, pp. 364-367.
"Semiconductors and Semimetals", Harold J. Hovel, Thomas J. Watson Research Center, IBM Corp., vol. II, Solar Cells, pp. 203-208.

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