Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-08-10
2009-12-29
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S330000, C430S325000, C430S326000, C525S418000, C528S288000, C528S296000, C438S952000
Reexamination Certificate
active
07638262
ABSTRACT:
The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1,where,A is a nonaromatic linking moiety,R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and,Y′ is independently a (C1-C20) hydrocarbyl linking moiety.The invention further relates to a process for imaging the antireflective coating composition.
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Lu Ping-Hung
Shan Jianhui
Wu Hengpeng
Xiang Zhong
Yao Huirong
AZ Electronic Materials USA Corp.
Hamilton Cynthia
Jain Sangya
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