Antireflective composition for photoresists

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S311000, C430S330000, C430S325000, C430S326000, C525S418000, C528S288000, C528S296000, C438S952000

Reexamination Certificate

active

07638262

ABSTRACT:
The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1,where,A is a nonaromatic linking moiety,R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and,Y′ is independently a (C1-C20) hydrocarbyl linking moiety.The invention further relates to a process for imaging the antireflective coating composition.

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