Antireflective coatings

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S271100, C430S910000

Reexamination Certificate

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10455095

ABSTRACT:
An antireflective coating composition including a polyester and/or a polyurethane; and a crosslinker selected from the group consisting of tetraamidomethyl ethers.

REFERENCES:
patent: 4544691 (1985-10-01), Dexter et al.
patent: 5324788 (1994-06-01), Kuo
patent: 5597868 (1997-01-01), Kunz
patent: 6042990 (2000-03-01), Shao et al.
patent: 6080530 (2000-06-01), Shao et al.
patent: 6156479 (2000-12-01), Meador et al.
patent: 6165684 (2000-12-01), Mizutani et al.
patent: 6190839 (2001-02-01), Pavelchek et al.
patent: 6268457 (2001-07-01), Kennedy et al.
patent: 11171887 (1999-06-01), None
English language abstract of JP 11-171887.
Jim D. Meador et al.; Recent Progress in 193 nm Antireflective Coatings; SPIE; Feb. 26, 1999; pp. 800-809; vol. 3678.
Handbook of Microlithography, Micromachining, and Microfabrication, vol. 1: MICROLITHOGRAPHY; pp. 366-368; SPIE Optical Engineering Press; Bellingham, Washington, USA.
Sorenson, Wayne R.: Preparative Methods of Polymer Chemistry; Interscience Publishers, Inc.; New York; 1961; E.I. du Pont de Nemours & Company, Inc.

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