Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1994-12-28
1997-06-03
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430325, 430326, 430328, 430330, 430510, 430512, 430513, 430514, G03C 1825
Patent
active
056353332
ABSTRACT:
Reduction of reflection from an integrated circuit substrate during exposure of a photoresist layer on a surface such as an integrated circuit wafer is minimized by incorporating an antireflective coating between the photoresist layer and the integrated circuit substrate. The antireflective layer, after exposure and development of the photoresist layer, is preferably removed by exposing the non-masked antireflective layer to activating radiation while heating the coating to induce a solubilizing reaction in an antireflective coating and a curing reaction in an overlying photoresist mask. Thereafter, the exposed portions of the antireflective layer are removed by treatment with a suitable developer.
REFERENCES:
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4668606 (1987-05-01), DoMinh et al.
patent: 4719166 (1988-01-01), Blevins et al.
patent: 4822718 (1989-04-01), Latham et al.
patent: 4828960 (1989-05-01), Hertog
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5498514 (1996-03-01), Nakao et al.
M. Bolsen, et al.; "One Micron Lithography Using a Dyed Resist on Highly Reflective Topography", Solid State Technology, Feb. 1986.
Dean Kim R.
Miller Daniel A.
Petersen John S.
Goldberg Robert L.
Sematech Inc.
Shipley Company L.L.C.
Young Christopher G.
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