Antireflective coating for microlithography

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing

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4302711, 528125, G03C 1825

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active

056078242

ABSTRACT:
A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

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Percec, V.; Clough, R. S.; Rinaldi, P. L.; and Litman, V. E. Termination by Reductive Elimination in the Polyetherification of Bis (arylchlorides), Activated by carbonyl Groups, with Bisphenolates, Macromolecules. 1991, 24, 5889-5892.

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