Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1994-07-27
1997-03-04
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
4302711, 528125, G03C 1825
Patent
active
056078242
ABSTRACT:
A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
REFERENCES:
patent: 4175175 (1979-11-01), Johnson et al.
patent: 4320224 (1982-03-01), Rose et al.
patent: 4575399 (1986-03-01), Tanaka et al.
patent: 4609614 (1986-09-01), Pampalone et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5126289 (1992-06-01), Ziger
patent: 5234990 (1993-08-01), Flaim et al.
Percec, V.; Clough, R. S.; Rinaldi, P. L.; and Litman, V. E. Termination by Reductive Elimination in the Polyetherification of Bis (arylchlorides), Activated by carbonyl Groups, with Bisphenolates, Macromolecules. 1991, 24, 5889-5892.
Fahey James T.
Herbst Brian W.
Linehan Leo L.
Moreau Wayne M.
Spinillo Gary T.
Chu John S.
International Business Machines - Corporation
Soucar, Esq. Steven J.
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