Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-01
2005-02-01
Huff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S322000, C430S510000, C430S512000, C430S926000, C430S927000
Reexamination Certificate
active
06849373
ABSTRACT:
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
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DoCanto Manuel
Pavelchek Edward K.
Barreca Nicole
Corless Peter F.
Edwards & Angell LLP
Frickey Darryl P.
Huff Mark F.
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