Antireflective coating composition based on silicon polymer

Details Antireflective coating composition based on silicon polymer Antireflective coating composition based on silicon polymer

2007-02-20

2010-06-15

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S311000, C430S323000, C430S313000, C430S325000, C430S270100, C528S040000

Reexamination Certificate

active

07736837

ABSTRACT:
The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1,where, R1is selected from C1-C4alkyl. The invention also relates to a process for imaging this composition.

REFERENCES:
patent: 3474054 (1969-10-01), White
patent: 4200729 (1980-04-01), Calbo
patent: 4251665 (1981-02-01), Calbo
patent: 4491628 (1985-01-01), Ito et al.
patent: 5187019 (1993-02-01), Calbo et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5853808 (1998-12-01), Arkles et al.
patent: 6069259 (2000-05-01), Crivello
patent: 6087064 (2000-07-01), Lin et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6447980 (2002-09-01), Rahman et al.
patent: 6515073 (2003-02-01), Sakamoto et al.
patent: 6723488 (2004-04-01), Kudo et al.
patent: 6770726 (2004-08-01), Arkles et al.
patent: 6790587 (2004-09-01), Feiring et al.
patent: 6818250 (2004-11-01), George et al.
patent: 6849377 (2005-02-01), Feiring et al.
patent: 6866984 (2005-03-01), Jung et al.
patent: 6916543 (2005-07-01), De et al.
patent: 6916590 (2005-07-01), Kaneko et al.
patent: 2002/0042020 (2002-04-01), Gallagher et al.
patent: 2002/0198269 (2002-12-01), Zampini et al.
patent: 2003/0120018 (2003-06-01), Baldwin et al.
patent: 2003/0198877 (2003-10-01), Pfeiffer et al.
patent: 2005/0054216 (2005-03-01), Daley
patent: 2005/0118541 (2005-06-01), Ahn et al.
patent: 2005/0277058 (2005-12-01), Iwabuchi et al.
patent: 2006/0058489 (2006-03-01), Angelopoulos et al.
patent: 2006/0105181 (2006-05-01), Lin et al.
patent: 2006/0287454 (2006-12-01), Yamahiro et al.
patent: 2007/0015977 (2007-01-01), McCann et al.
patent: 2008/0008954 (2008-01-01), Abdallah et al.
patent: 2008/0196626 (2008-08-01), Wu et al.
patent: 2005-221534 (2005-08-01), None
patent: WO 97/10282 (1997-03-01), None
patent: WO 01/98834 (2001-12-01), None
patent: WO 2004/078767 (2004-09-01), None
patent: WO 2004/113417 (2004-12-01), None
patent: WO 2006/065321 (2006-06-01), None
English Language Abstract of JP 2005-221534 A, date of Jp document Aug. 18, 2005.
Machine Language English Translation from JPO of JP 2005-221534 A, printed Apr. 2007.
B. Arkles et al., “High Density Silicon Dioxide Coatings by UV and Thermal Processing”, Silicones in Coatings III, Mar. 28-30, 2000, Barcelona, Spain.
B. Arkles et al., “Staged Development of Modified Silicon Dioxide Films”, Journal of Sol-Gel Science and Technology vol. 8, pp. 465-pp. 469 (1997).
Y. Huo et al., “Synthesis and Properties of Hybrid Organic-Inorganic Materials Containing Covalently Bonded Luminescent Polygermanes”, Chem. Mater. vol. 17, pp. 157-pp. 163 (2005).
S. Kodama, “Synthesis of Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization”, SPIE vol. 4690, pp. 76-83 (2002).
Q. Pan et al., “Spin-on-glass thin films prepared from a novel polysilsesquioxane by thermal and ultraviolet-irradiation methods”, Thin Solid Films vol. 345, pp. 244-pp. 254 (1999).
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration (Form PCT/ISA/220), International Search Report (Form PCT/ISA/21 0), and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2008/000517, submitted Feb. 26, 2009 no publication date given.
Notification of Transmittal of the International Search Report and the Written Opinon of the International Searching Authoty, or the Declaration (Form PCT/ISA/220), International Search Report (Form PCT/ISA/210), and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2008/003523 dated Jun. 25, 2009.

Affiliated with

Also associated with

Rating

Antireflective coating composition based on silicon polymer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antireflective coating composition based on silicon polymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antireflective coating composition based on silicon polymer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4214811