Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-02-01
2011-02-01
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S313000, C430S323000, C430S270100, C438S952000
Reexamination Certificate
active
07879530
ABSTRACT:
A composition comprising (A) a polymer having an alcohol structure with plural fluorine atoms substituted at α- and α′-positions and having k=0.01-0.4 and (B) an aromatic ring-containing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.
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Hatakeyama Jun
Kinsho Takeshi
Noda Kazumi
Tachibana Seiichiro
Birch & Stewart Kolasch & Birch, LLP
Hamilton Cynthia
Shin-Etsu Chemical Co. , Ltd.
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