Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-11-21
2011-10-18
Hamilton, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S326000, C430S327000, C430S270100, C525S245000, C526S200000
Reexamination Certificate
active
08039201
ABSTRACT:
The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer,where, R1to R8are independently selected from hydrogen and C1-C4alkyl, W1is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2comprises a chromophore group, and W3Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.
REFERENCES:
patent: 3474054 (1969-10-01), White
patent: 3477990 (1969-11-01), Dante et al.
patent: 3880946 (1975-04-01), Labana et al.
patent: 3956241 (1976-05-01), Steele et al.
patent: 4200729 (1980-04-01), Calbo
patent: 4248938 (1981-02-01), Takana et al.
patent: 4251665 (1981-02-01), Calbo
patent: 4363896 (1982-12-01), Chattha
patent: 4491628 (1985-01-01), Ito et al.
patent: 4510024 (1985-04-01), Kishida et al.
patent: 4734468 (1988-03-01), Marx
patent: 4908397 (1990-03-01), Barsotti et al.
patent: 5187019 (1993-02-01), Calbo et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5410005 (1995-04-01), Nemoto et al.
patent: 5597868 (1997-01-01), Kunz
patent: 5631332 (1997-05-01), Karasawa et al.
patent: 5677380 (1997-10-01), Matsumura et al.
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5886102 (1999-03-01), Sinta et al.
patent: 6265073 (2001-07-01), Nakamura et al.
patent: 6410206 (2002-06-01), Ueda et al.
patent: 6410209 (2002-06-01), Adams et al.
patent: 6447980 (2002-09-01), Rahman et al.
patent: 6488509 (2002-12-01), Ho et al.
patent: 6652971 (2003-11-01), Delmotte et al.
patent: 6663916 (2003-12-01), Puligadda et al.
patent: 6670425 (2003-12-01), Puligadda et al.
patent: 6680160 (2004-01-01), Enomoto et al.
patent: 6686124 (2004-02-01), Angelopoulos et al.
patent: 6723488 (2004-04-01), Kudo et al.
patent: 6790587 (2004-09-01), Feiring et al.
patent: 6818258 (2004-11-01), Kaneko et al.
patent: 6818381 (2004-11-01), Khojasteh et al.
patent: 6849377 (2005-02-01), Feiring et al.
patent: 6866984 (2005-03-01), Jung et al.
patent: 6894104 (2005-05-01), Xu et al.
patent: 6916590 (2005-07-01), Kaneko et al.
patent: 6927266 (2005-08-01), Arase et al.
patent: 6939661 (2005-09-01), Kang et al.
patent: 6956241 (2005-10-01), Sugawara et al.
patent: 7081511 (2006-07-01), Wu et al.
patent: 7264913 (2007-09-01), Wu et al.
patent: 7553905 (2009-06-01), Abdallah et al.
patent: 7638262 (2009-12-01), Wu et al.
patent: 2006/0058468 (2006-03-01), Wu et al.
patent: 2006/0105248 (2006-05-01), Montgomery et al.
patent: 2006/0134547 (2006-06-01), Huang et al.
patent: 2006/0234156 (2006-10-01), Kishioka
patent: 2006/0263720 (2006-11-01), Mori
patent: 2006/0275696 (2006-12-01), Zampini et al.
patent: 2007/0004228 (2007-01-01), Hatanaka et al.
patent: 2007/0042289 (2007-02-01), Thackeray et al.
patent: 2007/0105040 (2007-05-01), Toukhy et al.
patent: 2007/0172759 (2007-07-01), Ogihara et al.
patent: 2007/0238029 (2007-10-01), Takei et al.
patent: 2007/0298349 (2007-12-01), Zhang et al.
patent: 2008/0008955 (2008-01-01), Brodsky et al.
patent: 2008/0227037 (2008-09-01), Hatakeyama et al.
patent: 2009/0035704 (2009-02-01), Zhuang et al.
patent: 2010/0015550 (2010-01-01), Liu et al.
patent: 2010/0233634 (2010-09-01), Noya et al.
patent: 275 125 (1989-08-01), None
patent: 0 864 926 (1998-09-01), None
patent: 1 298 493 (2003-04-01), None
patent: 1 662 769 (2006-05-01), None
patent: 1 736 826 (2006-12-01), None
patent: 2 364 317 (2002-01-01), None
patent: 1-221702 (1989-09-01), None
patent: 7-316268 (1995-12-01), None
patent: 2005-221963 (2005-08-01), None
patent: WO 02-36692 (2002-05-01), None
patent: WO 03/067329 (2003-08-01), None
patent: WO 2005/093513 (2005-06-01), None
patent: WO 2006/030320 (2006-03-01), None
patent: WO 2006/040918 (2006-04-01), None
patent: WO 2006/040922 (2006-04-01), None
patent: WO 2007094299 (2007-08-01), None
“Aliphatic”, Grant & Hackh's Chemical Dictionary, Fifth ed, Grant et al eds, McGraw-Hill Book Company, year 1987 no month, p. 22, printed in United STates of America.
“Aliphatic compounds”, IUPAC Goldbook, two pages , http//goldbook.iupac.org/A00217.html, original source, PAC, 1995, 67, 1307 (Glossary of class names of organic compounds and reactivity intermediates based on structure (IUPAC Recommendations 1995) on p. 1313.
M. Switkes at al., “Immersion Liquids for Lithography in the Deep Ultraviolet”, Proc. Of SPIE vol. 5040, pp. 690-pp. 699, 2003.
English Language Abstract from EPO of JP 1-221702 A, date submited May 7, 2009.
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration (Form PCT/ISA/220), International Search Report (Form PCT/ISA/210), and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2008/003215, date submitted May 7, 2009.
Derwent-ACC-No: 1990-186312, Derwent-Week: 199025, abstract and clipped image of DD 275126A, 4 pages, year available 1990.
Office Action mail date Aug. 24, 2009 for U.S. Appl. No. 11/833,361.
Form PCT/ISA/220, Form PCT/ISA/210, and Form PCT/ISA/237 for PCT/IB2009/005459 mailed Sep. 23, 2009 which corresponds to U.S. Appl. No. 12/174,718.
Form PCT/ISA/220, Form PCT/ISA/210, and Form PCT/ISA/237 for PCT/IB2008/002064 mailed Jan. 16, 2009 which corresponds to U.S. Appl. No. 11/833,361.
Kodama et al., “Synthesis of Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization”, SPIE vol. 4690, pp. 76-pp. 83 (2002).
Nakano et al., “Thermal cationic curing with benzylammonium salts—2”, Progress in Organic Coatings vol. 28, pp. 143-pp. 148 (1996), obtained from Elsevier press. No month given.
Office Action mail date May 14, 2009 for U.S. Appl. No. 11/833,361.
Office Action mail date May 11, 2010 for U.S. Appl. No. 11/833,361.
Form PCT/IB/326, Form PCT/IB/373, and Form PCT/ISA/237 for PCT/IB2008/002064 mailed Feb. 18, 2010, which corresponds to U.S. Appl. No. 11/833,361.
Office Action mail date Dec. 24, 2009 for U.S. Appl. No. 12/174,718.
Office Action mail date Aug. 19, 2010 for U.S. Appl. No. 12/174,718.
Office Action mail date Jun. 14, 2011 for U.S. Appl. No. 12/174,718.
Pham et al, 2005, Epoxy Resins, Encyclopedia of Industrial Chemistry published on line Oct. 15, 2011, abstract from online and pp. 1-3, 7-22, 51-61 and 86-94.
Liu Weihong
Xiang Zhong
Yao Huirong
Yin Jian
AZ Electronic Materials USA Corp.
Hamilton Cynthia
Jain Sangya
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