Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-08-02
2011-08-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S272100, C430S271100, C264S447000, C525S523000
Reexamination Certificate
active
07989144
ABSTRACT:
The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2,where, R1to R12are independently selected from hydrogen and C1-C4alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
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Abdallah David
McKenzie Douglas
Rahman M. Dalil
Zhang Rhuzi
AZ Electronic Materials USA Corp
Hamilton Cynthia
Jain Sangya
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