Antihalation compositions

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S325000, C430S327000, C430S330000, C430S014000, C430S018000

Reexamination Certificate

active

07378222

ABSTRACT:
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

REFERENCES:
patent: 3036913 (1962-05-01), Burg
patent: 3287152 (1966-11-01), Alles et al.
patent: 3778413 (1973-12-01), Junger et al.
patent: 4060656 (1977-11-01), Naka et al.
patent: 4141733 (1979-02-01), Guild
patent: 4299938 (1981-11-01), Green et al.
patent: 4341859 (1982-07-01), Keane et al.
patent: 4362809 (1982-12-01), Chen et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4401749 (1983-08-01), Hoffmann et al.
patent: 4413052 (1983-11-01), Green et al.
patent: 4429034 (1984-01-01), Keane et al.
patent: 4459348 (1984-07-01), Jun et al.
patent: 4487889 (1984-12-01), Craun
patent: 4576898 (1986-03-01), Hoffmann et al.
patent: 4702992 (1987-10-01), Ishii et al.
patent: 4719166 (1988-01-01), Blevins et al.
patent: 4764561 (1988-08-01), Kiss et al.
patent: 4822718 (1989-04-01), Latham et al.
patent: 4840874 (1989-06-01), Shigemitzu et al.
patent: 4860062 (1989-08-01), Parks
patent: 4863827 (1989-09-01), Jain et al.
patent: 4885232 (1989-12-01), Spak
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4921778 (1990-05-01), Thackeray et al.
patent: 4981530 (1991-01-01), Clodgo et al.
patent: 5019481 (1991-05-01), Ito
patent: 5089374 (1992-02-01), Saeva
patent: 5100503 (1992-03-01), Allman et al.
patent: 5139918 (1992-08-01), Goel
patent: 5206116 (1993-04-01), Daniels et al.
patent: 5219788 (1993-06-01), Abernathey et al.
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5851730 (1998-12-01), Thackeray et al.
patent: 5851738 (1998-12-01), Thackeray et al.
patent: 6165697 (2000-12-01), Thackeray et al.
patent: 6190839 (2001-02-01), Pavelchek et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6316165 (2001-11-01), Pavelchek et al.
patent: 6368768 (2002-04-01), Jung et al.
patent: 6410209 (2002-06-01), Adams et al.
patent: 6451503 (2002-09-01), Thackeray et al.
patent: 6472128 (2002-10-01), Thackeray et al.
patent: 6528235 (2003-03-01), Thackeray et al.
patent: 6602652 (2003-08-01), Adams et al.
patent: 6767689 (2004-07-01), Pavelchek et al.
patent: 6773864 (2004-08-01), Thackeray et al.
patent: 6887648 (2005-05-01), Pavelchek et al.
patent: 7014982 (2006-03-01), Thackeray et al.
patent: 2002/0031729 (2002-03-01), Trefonas et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 0 501 178 (1992-09-01), None
patent: WO 90/03598 (1990-04-01), None
Lamola et al., “Chemically Amplified Resists”, Solid State Technology, Aug. 1991, pp. 53-60.
U.S. Appl. No. 90/008,359, filed Dec. 4, 2006, Thackeray et al.
U.S. Appl. No. 90/008,360, filed Dec. 4, 2006, Thackeray et al.

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