Antihalation compositions

Details Antihalation compositions Antihalation compositions

2006-03-21

2006-03-21

Chapman, Mark A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S327000, C430S330000, C430S014000, C430S018000

Reexamination Certificate

active

07014982

ABSTRACT:
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

REFERENCES:
patent: 3036913 (1962-05-01), Burg
patent: 3287152 (1966-11-01), Alles et al.
patent: 3778413 (1973-12-01), Junger et al.
patent: 4060656 (1977-11-01), Naka et al.
patent: 4141733 (1979-02-01), Guild
patent: 4299938 (1981-11-01), Green et al.
patent: 4341859 (1982-07-01), Keane et al.
patent: 4362809 (1982-12-01), Chen et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4401749 (1983-08-01), Hoffmann et al.
patent: 4413052 (1983-11-01), Green et al.
patent: 4429034 (1984-01-01), Keane et al.
patent: 4459348 (1984-07-01), Jun et al.
patent: 4487889 (1984-12-01), Craun
patent: 4576898 (1986-03-01), Hoffmann et al.
patent: 4702992 (1987-10-01), Ishii et al.
patent: 4719166 (1988-01-01), Blevins et al.
patent: 4764561 (1988-08-01), Kiss et al.
patent: 4822718 (1989-04-01), Latham et al.
patent: 4840874 (1989-06-01), Shigemitsu et al.
patent: 4860062 (1989-08-01), Parks
patent: 4863827 (1989-09-01), Jain et al.
patent: 4885232 (1989-12-01), Spak
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4921778 (1990-05-01), Thackeray et al.
patent: 4981530 (1991-01-01), Clodgo et al.
patent: 5019481 (1991-05-01), Ito
patent: 5089374 (1992-02-01), Saeva
patent: 5100503 (1992-03-01), Allman et al.
patent: 5139918 (1992-08-01), Goel
patent: 5206116 (1993-04-01), Daniels et al.
patent: 5219788 (1993-06-01), Abernathey et al.
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5851730 (1998-12-01), Thackeray et al.
patent: 5851738 (1998-12-01), Thackeray et al.
patent: 6165697 (2000-12-01), Thackeray et al.
patent: 6190839 (2001-02-01), Pavelchek et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6316165 (2001-11-01), Pavelchek et al.
patent: 6368768 (2002-04-01), Jung et al.
patent: 6472128 (2002-10-01), Thackeray et al.
patent: 6528235 (2003-03-01), Thackeray et al.
patent: 2002/0031729 (2002-03-01), Trefonas et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 278 691 (1990-05-01), None
patent: 0 501 178 (1992-09-01), None
patent: WO 90/03598 (1990-04-01), None
Elliott, “Integrated Circuit Fabrication Technology”, McGraw Hill Book Col, 1982 pp. 259, 263-275 and 305-309.
Lamola et al., “Chemically Amplified Resists”, Solid State Technology, Aug. 1991, pp. 53-60.

Affiliated with

Also associated with

Rating

Antihalation compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antihalation compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antihalation compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3571099