Anti-reflective layer and method for manufacturing semiconductor

Details Anti-reflective layer and method for manufacturing semiconductor Anti-reflective layer and method for manufacturing semiconductor

1994-09-12

1997-01-14

Lusignan, Michael

Coating processes

Coating has x-ray, ultraviolet, or infrared properties

427162, 4273855, 437235, 524557, B05D 500, B05D 506

Patent

active

055937250

ABSTRACT:
A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.

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