Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-12-20
2009-10-13
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S326000, C430S330000, C430S325000, C430S271100, C430S272100, C430S276100, C430S275100, C438S952000, C438S761000, C522S149000
Reexamination Certificate
active
07601483
ABSTRACT:
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
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Cox Robert Christian
Guerrero Douglas J.
Weimer Marc W.
Brewer Science Inc.
Hamilton Cynthia
Hovey & Williams, LLP
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