Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-04-13
2009-12-15
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S271100, C430S272100, C430S325000, C430S326000, C430S327000, C430S330000, C528S096000, C528S097000, C528S099000, C528S115000, C525S414000, C525S419000, C438S952000
Reexamination Certificate
active
07632626
ABSTRACT:
There is provided an anti-reflective coating forming composition for lithography comprising a polymer having an ethylenedicarbonyl structure and a solvent; an anti-reflective coating formed from the composition; and a method for forming photoresist pattern by use of the composition. The anti-reflective coating obtained from the composition can be used in lithography process for manufacturing a semiconductor device, has a high preventive effect for reflected light, causes no intermixing with photoresists, and has a higher etching rate than photoresists.
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Hamilton Cynthia
Nissan Chemical Industries Ltd.
Oliff & Berridg,e PLC
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