Anti-reflective coating forming composition containing...

Details Anti-reflective coating forming composition containing... Anti-reflective coating forming composition containing...

2004-08-27

2009-10-06

Lindsay, Jr., Walter L (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C430S270100, C438S952000, C252S501100

Reexamination Certificate

active

07598182

ABSTRACT:
There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.

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