Anti-reflective coating

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430299, 430317, 430327, 430329, 430318, G03C 500

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active

049101226

ABSTRACT:
A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.

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patent: 4376162 (1983-03-01), Kawata et al.
Chang et al., "An Ideal Projection Photolithography", 1981 Symposium on VLSI Technology, Digest of Technical Papers, Maui, HI, Sep. 1981.
Kodak, '80 Interface, Oct. 1980, pp. 109-113 (Carlson).
Hackh's Chemical Dictionary, Third Edition, 1944, pp. 132, and 230.
IEEE Transactions on Electronic Devices, Ed. 28, No. 11, Nov. 1981, pp. 1405-1410 (O'Toole).
Journal of Applied Photographic Engineering, vol. 7, No. 6, Dec. 1981, pp. 184-186 (Brewer).

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