Anti-reflection optical data storage disk master

Details Anti-reflection optical data storage disk master Anti-reflection optical data storage disk master

2004-11-29

2008-09-23

Angebranndt, Martin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S320000, C430S329000

Reexamination Certificate

active

07427466

ABSTRACT:
Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques described herein can improve resolution of the features created on the master by reducing mastering noise. The techniques include depositing a multi-layer structure adjacent a master substrate layer. The multi-layer structure includes an etch stop layer, an etch layer, and a photoresist layer. A thickness of each of the layers is selected to generate substantially no reflectivity for at least one interface of the multi-layer structure to substantially eliminate stray light effects. The photoresist layer defines a portable conformable mask (PCM) for the etch layer. The etch layer is etched through the contact mask to define a feature of the master in the etch layer. The etch stop layer thickness may be selected to be as thin as possible to reduce surface roughness of the multi-layer structure.

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