Anti-corrosion layer on objective lens for liquid immersion...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07924397

ABSTRACT:
Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.

REFERENCES:
patent: 3706485 (1972-12-01), Fawcett et al.
patent: 4500611 (1985-02-01), Nickol et al.
patent: 4568140 (1986-02-01), van der Werf et al.
patent: 5067781 (1991-11-01), Montanari et al.
patent: 5121256 (1992-06-01), Corie et al.
patent: 5139879 (1992-08-01), Aharoni et al.
patent: 5494743 (1996-02-01), Woodard et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5648860 (1997-07-01), Ooi et al.
patent: 5882773 (1999-03-01), Chow et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6084846 (2000-07-01), Jordache et al.
patent: 6166855 (2000-12-01), Ikeyama et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6417974 (2002-07-01), Schuster
patent: 6556353 (2003-04-01), Omura
patent: 6628574 (2003-09-01), Shimazaki et al.
patent: 7129009 (2006-10-01), French et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2005/0007567 (2005-01-01), Pierrat et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2006/0001851 (2006-01-01), Grant et al.
patent: 3537626 (1986-04-01), None
patent: 1172670 (2002-01-01), None
patent: 2000131503 (2000-05-01), None
patent: 2000-131503 (2000-12-01), None
Translation of Suzuki (JP-A-2000-131503).
Translation of DE-3537626.
Hoffnagle, J.A., et al, “Liquid Immersion Deep-Ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B 17(6) , Nov./Dec. 1999, pp. 3306-3309.
Swikes, M., et al., “Immersion Lithography at 157 nm”, J. Vac. Sci. Technol. B 19(6), Nov./Dec. 2001, pp. 2353-2356.
Office Action issued Feb. 23, 2009 in related U.S. Appl. No. 11/548,551, filed Oct. 11, 2006, 14 pages.

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