Anodically bonded ultra-high-vacuum cell

Active solid-state devices (e.g. – transistors – solid-state diode – Including semiconductor material other than silicon or...

Reexamination Certificate

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Details

C257S622000, C257S773000, C257S774000, C257SE23004, C257SE23009

Reexamination Certificate

active

07470971

ABSTRACT:
The present invention discloses an anodically bonded vacuum cell structure with a glass substrate including a cavity, and a substrate deposited on the glass substrate, thereby enclosing the cavity to form a bonding interface. The bonding interface having silicon such that the substrate includes a layer of silicon or a secondary substrate with silicon layer bonded onto the secondary substrate.

REFERENCES:
patent: 4617606 (1986-10-01), Shak et al.
patent: 4625561 (1986-12-01), Mikkor
patent: 4701826 (1987-10-01), Mikkor
patent: 4773972 (1988-09-01), Mikkor
patent: 4849374 (1989-07-01), Chen et al.
patent: 4908921 (1990-03-01), Chen et al.
patent: 4960177 (1990-10-01), Holm-Kennedy et al.
patent: 5591679 (1997-01-01), Jakobsen et al.
patent: 5705070 (1998-01-01), Saaski et al.
patent: 5747169 (1998-05-01), Fan et al.
patent: 5929497 (1999-07-01), Chavan et al.
patent: 6467354 (2002-10-01), Allen
patent: 6661637 (2003-12-01), McIntosh et al.
patent: 6811916 (2004-11-01), Mallari et al.
patent: 6923625 (2005-08-01), Sparks
patent: 6929974 (2005-08-01), Ding et al.
patent: 6938310 (2005-09-01), Hawkins et al.
patent: 6939778 (2005-09-01), Harpster et al.
patent: 7008855 (2006-03-01), Baney et al.
patent: 7045868 (2006-05-01), Ding et al.
patent: 7126112 (2006-10-01), Anderson et al.
patent: 7204737 (2007-04-01), Ding et al.
patent: 2003/0215110 (2003-11-01), Rhoads et al.
patent: 2004/0077117 (2004-04-01), Ding et al.
patent: 2004/0255643 (2004-12-01), Wise et al.
patent: 2006/0063462 (2006-03-01), Ding et al.
patent: 2006/0105503 (2006-05-01), Ding et al.
patent: 2007/0031961 (2007-02-01), Ho et al.
patent: 2008/0047926 (2008-02-01), Santini et al.
patent: 1344745 (2003-09-01), None

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