Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-12-01
1990-07-03
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430276, 204 58, 204 387, 204 383, G03C 194, G03C 174, C25D 500, C25D 1108
Patent
active
049390686
ABSTRACT:
The surface of plates, foils or ribbons consisting of aluminum or aluminum alloys are anodically oxidized in an aqueous electrolyte as the anodizing bath by a process in which the electrolyte used may contain organic and inorganic acids together with further additives. The aqueous electrolyte must contain one or more silanes I of the formula I
REFERENCES:
patent: 3935080 (1976-01-01), Gumbinner et al.
patent: 3945899 (1976-03-01), Nikaido et al.
patent: 4063949 (1977-12-01), Uhlig et al.
patent: 4087341 (1978-05-01), Takahashi et al.
patent: 4301229 (1981-11-01), Sakaki et al.
patent: 4383897 (1983-05-01), Gillich et al.
patent: 4399021 (1983-08-01), Gillich et al.
patent: 4448647 (1984-05-01), Gillich et al.
patent: 4452674 (1984-06-01), Gillich et al.
Japanese Patent Abstract 57-101,695, pending U.S. application No. 064,539 (Lauke et al.).
K. H. Naser, "Physikalisch-Chemische Rechenaufgaben" published 1970, 4th Ed., p. 370.
Lauke Harald
Leyrer Reinhold J.
Nick Bernhard
BASF - Aktiengesellschaft
Hamilton Cynthia
Michl Paul R.
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