Anodic bonding method and apparatus for X-ray masks

Details Anodic bonding method and apparatus for X-ray masks Anodic bonding method and apparatus for X-ray masks

1984-02-16

1986-12-30

Buffalow, Edith

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B32B 900

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046328718

ABSTRACT:
A structure for use in an X-ray membrane (pellicle) mask is provided in which anodic bonding of layers is employed. Anodic bonding as used here provides a permanent bond between the layers, has zero thickness and provides substantial improvements in the obtained flatness of the mask by eliminating conventional glue for attachment. By applying a voltage between a layer, such as silicon, and a glass plate, and simultaneously heating both elements a permanent bond is established which is extremely flat thus providing minimum misalignment of the mask during subsequent X-ray lithography fabrication.

REFERENCES:
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patent: 4293624 (1981-10-01), Buckley
patent: 4411972 (1983-10-01), Narken et al.
patent: 4451544 (1984-05-01), Kawabucki
T. R. Anthony, "Anodic Bonding of Imperfect Surfaces," Journal of Applied Physics, vol. 54, No. 5, May 1983, pp. 2419-2428.

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