Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-05-12
2000-01-04
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 65 602, C23C 1434, C03C 1736
Patent
active
060106026
ABSTRACT:
A low emissivity coated article comprising a glass substrate and a coating comprising a layer of infrared reflective metal between layers of antireflective metal oxide is heated to a temperature below the strain point of the substrate for a sufficient time to anneal the coating without affecting the substrate to improve the chemical and mechanical durability of the coating.
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Arbab Mehran
Finley James J.
Miller Larry A.
Lepiane Donald C.
McDonald Rodney G.
Nguyen Nam
PPG Industries Ohio Inc.
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