Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1993-10-22
1995-05-23
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430328, 2041293, 20412965, 20412975, 216 46, 216 87, G03F 700, C25F 312, C25F 314
Patent
active
054181143
ABSTRACT:
A mercury cadmium telluride (MCT) substrate 30 is immersed in a liquid 34 (e.g. 0.1 molar concentration hydrochloric acid) and illuminated with collimated radiation 24 (e.g. collimated visible/ultraviolet radiation) produced by a radiation source 20 (e.g. a 150 Watt mercury xenon arc lamp). A window 26 which is substantially transparent to the collimated radiation 24 allows the radiated energy to reach the MCT substrate 30. An etch mask 32 may be positioned between the radiation source 20 and the substrate 30. The MCT substrate 30 and liquid 34 may be maintained at a nominal temperature (e.g. 25.degree. C.). Without illumination, the MCT is not appreciably etched by the liquid. Upon illumination the etch rate is substantially increased. A further aspect is the addition of a passivant (e.g. iodine) to the liquid which forms a substantially insoluble passivation layer 36 on the substrate which is removed or partially removed by the radiation 24. Sidewalls 40 are protected from the etchant by vertical passivation layers 42, further increasing the difference between the illuminated and uniiluminated etch rates.
REFERENCES:
patent: 4391683 (1983-07-01), Buckley
patent: 4414066 (1983-11-01), Forrest
patent: 4415414 (1983-11-01), Burton
patent: 5157000 (1992-10-01), Elkind
patent: 5165283 (1992-11-01), Kurtz
Duda Kathleen
Kestersom James C.
Pylant Chris D.
Stoltz Richard A.
Texas Instruments Incorporated
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