Anisotropic etching of aluminum

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156646, 156656, 1566591, 156665, 204192E, 252 791, C23F 102

Patent

active

043701965

ABSTRACT:
A method of anisotropic etching of aluminum or an alloy thereof comprising using as the etch gas a mixture of boron trichloride, trichloromethane and hydrogen. The etchant mixture advantageously also contains nitrogen and helium.

REFERENCES:
patent: 4256534 (1981-03-01), Levinstein
Vossen, Pure & Applied Chemistry, vol. 52, pp. 1759-1765 (1980).
Abstract No. 288 from Electrochemical Society Extended Abstracts, vol. 81 (2), pp. 703-705 (1981) by Bruce et al.

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