Angled elongated features for improved alignment process...

Details Angled elongated features for improved alignment process... Angled elongated features for improved alignment process...

2007-12-20

2008-12-23

Geyer, Scott B (Department: 2812)

Semiconductor device manufacturing: process

Miscellaneous

C257SE21001

Reexamination Certificate

active

07468331

ABSTRACT:
Elongated features may be incorporated at least partially in an alignment region. The alignment region may be defined by a plurality of alignment features aligned along a first axis. A long axis of the elongated features may be neither parallel nor perpendicular to the first axis. The alignment region may further include another plurality of alignment features aligned a second axis that is not parallel to the first axis. The second axis may be neither parallel to or perpendicular to the long axis.

REFERENCES:
patent: 4932064 (1990-06-01), Kasahara
patent: 6504254 (2003-01-01), Takizawa
patent: 2003/0101610 (2003-06-01), Yu et al.

Affiliated with

Also associated with

Rating

Angled elongated features for improved alignment process... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Angled elongated features for improved alignment process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Angled elongated features for improved alignment process... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4034420