Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks
Reexamination Certificate
2008-01-01
2008-01-01
Vu, Hung (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Alignment marks
Reexamination Certificate
active
10875065
ABSTRACT:
Elongated features may be incorporated at least partially in an alignment region. The alignment region may be defined by a plurality of alignment features aligned along a first axis. A long axis of the elongated features may be neither parallel nor perpendicular to the first axis. The alignment region may further include another plurality of alignment features aligned a second axis that is not parallel to the first axis. The second axis may be neither parallel to or perpendicular to the long axis.
REFERENCES:
patent: 4932064 (1990-06-01), Kasahara
patent: 6504254 (2003-01-01), Takizawa
patent: 2003/0101610 (2003-06-01), Yu et al.
Fish & Richardson P.C.
Intel Corporation
Vu Hung
LandOfFree
Angled elongated features for improved alignment process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Angled elongated features for improved alignment process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Angled elongated features for improved alignment process... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3946820