Analyzing method and apparatus for minute foreign substances, an

Details Analyzing method and apparatus for minute foreign substances, an Analyzing method and apparatus for minute foreign substances, an

1996-02-12

1999-03-02

Dutton, Brian

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

G01R 3126, H01L 2166

Patent

active

058770356

ABSTRACT:
To enable observation, analysis and evaluation of minute foreign substances by adopting a method for enabling performance of linkage between equipment coordinates of a particle examination equipment and apparatus coordinates of an analyzing apparatus such as SEM which is not a particle examination equipment with a precision higher than that with which coordinate linkage is performed between conventional equipment and apparatus coordinates. An analyzing method for analyzing minute foreign substances includes the steps of determining the position of a minute foreign substance on the surface of a sample in a particle examination equipment, transferring the sample to a coordinate stage of an analyzing apparatus and inputting the position of the minute foreign substance determined by the particle examination equipment to thereby analyze the contents of this minute foreign substance. It is characterized by linking the equipment coordinates adopted by the particle examination equipment with the apparatus coordinates adopted by the analyzing apparatus by use of the same coordinate system based on the configurations of the sample.

REFERENCES:
patent: 5233191 (1993-08-01), Noguchi et al.
patent: 5267017 (1993-11-01), Uritsky et al.
patent: 5274434 (1993-12-01), Morioka et al.
European search report dated Jan. 16, 1998, European patent application No. EPP11825A.
T. Hattori et al., "An Automated Particle Detection and Identification System in VLSI Wafer Processing," Solid State Technology, vol. 34, No. 9, Sep. 1991, pp. S01-S06.

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