Ampoule splash guard apparatus

Details Ampoule splash guard apparatus Ampoule splash guard apparatus

2005-10-07

2008-12-16

Bushey, Scott (Department: 1797)

Gas and liquid contact apparatus

Contact devices

Liquid tank

C261SDIG065

Reexamination Certificate

active

07464917

ABSTRACT:
Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process system. The apparatus contains a canister or an ampoule for containing a chemical precursor and a splash guard contained within the ampoule. The splash guard is positioned to obstruct the chemical precursor in a liquid state from being bumped or splashed into a gas outlet during the introduction of a carrier gas into the ampoule. The carrier gas is usually directed into the ampoule through a gas inlet and combines with the vaporized chemical precursor to form a precursor gas. The splash guard is also positioned to permit the passage of the precursor gas from the gas outlet. In one example, the gas outlet contains a stem with a tapered tip and the splash guard is positioned at an angle parallel to the plane of the tapered tip.

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