Amplification type positive resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S286100, C430S581000, C430S905000, C430S910000, C430S913000, C430S914000, C430S919000, C562S045000

Reexamination Certificate

active

07135268

ABSTRACT:
The present invention provides a sulfonate of the formula (I′):wherein Q1, Q2, Q3, Q4and Q5each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, or electron attractive group, with the proviso that at least one of Q1, Q2, Q3, Q4and Q5represents alkyl having 3 to 16 carbon atoms or alkoxy having 3 to 16 carbon atoms, and at least one of Q1, Q2, Q3, Q4and Q5is electron attractive group; andA′+represents a counter ion of the formula (IIa), (IIb), (IIc) or (IId) which are identified in the specification.The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I)wherein A+represents counter ion, and Q1, Q2, Q3, Q4and Q5are as defined above; andresin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

REFERENCES:
patent: 6010820 (2000-01-01), Aoai et al.
patent: 2002/0058200 (2002-05-01), Fujimori et al.
patent: 2002/0077493 (2002-06-01), Ohsawa et al.
patent: 2003/0068573 (2003-04-01), Takata et al.
patent: 6-199770 (1994-07-01), None
patent: 9-258435 (1997-10-01), None
patent: 2000-53607 (2000-02-01), None

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