Amorphous silicon imaging members with barrier layers

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product

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430 57, 430 66, 430 67, 430 86, G03G 5086, G03G 514

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active

047600055

ABSTRACT:
An imaging member comprised of a supporting substrate, a barrier layer of hydrogenated amorphous silicon nitride with dopants, a hydrogenated amorphous silicon photoconducting layer, and in contact therewith a top overcoating layer of nonstoichiometric silicon nitride.

REFERENCES:
patent: 4418132 (1983-11-01), Yamazaki
patent: 4451546 (1984-05-01), Kawamura et al.
patent: 4460669 (1984-07-01), Ogawa et al.
patent: 4460670 (1984-07-01), Ogawa et al.
patent: 4483911 (1984-11-01), Ogawa et al.
patent: 4501807 (1985-02-01), Shirai et al.
patent: 4510224 (1985-04-01), Yamazaki et al.
patent: 4518670 (1985-05-01), Matsuzaki et al.
patent: 4522905 (1985-06-01), Ogawa et al.
patent: 4666803 (1987-05-01), Yamazaki
patent: 4666806 (1987-05-01), Pai et al.

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