Amorphous multi-layered structure and method of making the same

Details Amorphous multi-layered structure and method of making the same Amorphous multi-layered structure and method of making the same

1996-03-13

1998-11-17

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427 78, 427576, 427577, 4274192, 4274197, 4272481, H05H 124, C23C 1600, B05D 136, B05D 512

Patent

active

058373314

ABSTRACT:
An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.

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