Amorphous carbon absorber/shifter film for attenuated phase...

Details Amorphous carbon absorber/shifter film for attenuated phase... Amorphous carbon absorber/shifter film for attenuated phase...

2005-02-08

2005-02-08

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06852455

ABSTRACT:
An exemplary embodiment relates to a phase shifting mask including a glass substrate layer and an amorphous carbon absorber layer located above the glass substrate layer. The amorphous carbon absorber layer includes apertures through which light passes unaltered to the glass substrate layer.

REFERENCES:
patent: 5830332 (1998-11-01), Babich et al.
patent: 6548417 (2003-04-01), Dao et al.
patent: 6573030 (2003-06-01), Fairbairn et al.

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